The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry,X-ray photoelectron spectroscopy and infrared reflectance spectroscopy |
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| Institution: | 1. Department of Chemistry, The Pennsylvania State University, 152 Davey Laboratory, University Park, PA 16802,USA;2. Lucent Technologies/AT&T Bell Laboratories, 700 Mountain Avenue, Murray Hill, NJ 07974,USA;3. National Renewable Energy Laboratory (NREL), 1617 Cole Boulevard, Golden,CO 80401,USA;1. Metabolism, Infection and Immunity Section, National Human Genome Research Institute, National Institutes of Health, Bethesda, MD, USA;2. Office of Data Science and Emerging Technologies, National Institute of Allergy and Infectious Diseases, National Institutes of Health, Bethesda, MD, USA;3. United Mitochondrial Disease Foundation, Pittsburgh, PA, USA;4. People Against Leigh Syndrome, Houston, TX, USA |
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| Abstract: | The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering. |
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