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The Role of γ -Aminopropyltriethoxysilane (γ -APS) on Thermal Stability of TEOS-PDMS Ormosils
Authors:R Peña-Alonso  F Rubio  J Rubio
Institution:(1) Departamento de Química-Física de Superficies y Procesos—Instituto de Cerímica y Vidrio (CSIC), Campus de Cantoblanco de la UAM., 28049 Madrid, Spain
Abstract:The degradation process of TEOS-PDMS Ormosils containing different amounts of γ -APS has been studied by means of DTA, TG, FTIR and 29Si-NMR measurements. It has been found that the amount of γ -APS improved the thermal properties of Ormosil materials. The increase in γ -APS content causes the increment on the decomposition temperatures and activation energies of the studied Ormosils. These results have been attributed to the favourable effect of γ -APS in the copolymerisation reaction between TEOS and PDMS molecules. 29Si-NMR analyses have shown that the incorporation of γ -APS increases the concentration of D(Q) units in the Ormosil structure, i.e., increases the number of TEOS molecules bonded to PDMS ones. Initial decomposition temperature (IDT), temperature of maximum weight loss rate (Tmax), integral procedure decomposition temperature (IPDT) and activation energy values (E) were calculated from different equations which described the degradation of these materials. Addition of 10 wt% γ -APS produced an increase of 63C in the IDT and of 115 and 110C, respectively, for Tmax and IPDT (up to 478 and 610C) compared to the free γ -APS Ormosil. Activation energy values also rise up to 69.4 kJ⋅ mol−1 by introducing 10 wt% of γ -APS.
Keywords:ormosil  thermal stability  ATD-TG  activation energy
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