| 基于同步辐射光刻的三维微细加工方法 |
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| 引用本文： | 李以贵,洞出光洋,杉山进.基于同步辐射光刻的三维微细加工方法[J].光学与光电技术,2008,6(1):82-84. |
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| 作者姓名： | 李以贵 洞出光洋 杉山进 |
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| 作者单位： | 1. 上海交通大学微纳米科学技术研究院,上海,200030
2. 日本立命馆大学微系统系,滋贺县,草津市,525-8577 |
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| 摘 要： | 同步辐射光刻的三维聚甲基丙烯酸甲酯（Polymethyl Methacrylate，PMMA）微结构制造对X射线光刻掩膜板的吸收体形状和PMMA所吸收的X射线能量分布有直接影响，即三维PMMA微结构形状取决于X射线光刻掩膜板的吸收体形状。如果不对X射线光刻掩膜板进行补偿，在被曝光的结构中可观察到结构侧面的变形。研究了引起这种结构侧面变形的各种原因并提出X射线剂量对刻蚀深度非线性曲线是最直接的原因。基于X射线光刻掩膜板图形形状和实际制造的三维PMMA微结构的误差，X射线光刻掩膜板从双直角三角形变为双半圆图形使得微注射针阵列的强度得到增强。为了量化实际制造的三维PMMA微结构的误差，给出了X射线吸收能量分布与微结构的结构形状数据。
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| 关 键 词： | 聚甲基丙烯酸甲酯 同步辐射 X射线光刻 微结构 3-D结构 |
| 文章编号： | 1672-3392（2008）01-0082-03 |
| 收稿时间： | 2007-06-21 |
| 修稿时间： | 2007-09-05 |
Development of 3-D Microfabrication Method by SR Lithography |
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| LI Yi-gui,HORADE M,SUGIYAMA Susumu.Development of 3-D Microfabrication Method by SR Lithography[J].optics&optoelectronic technology,2008,6(1):82-84. |
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| Authors: | LI Yi-gui HORADE M SUGIYAMA Susumu |
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| Institution: | LI Yi-gui Institute of Micro/Nano Science , Technology,Shanghai Jiaotong University,Shanghai 200030,China HORADE M SUGIYAMA Susumu Department of Microsystem,Ritsumeikan University,Kusatsu Shiga 525-857,Japan |
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| Abstract: | PMMA(Polymethyl Methacrylate)microstructures fabricated by X-ray lithography with plane-pattern to cross- section transfers technique has a direct influent from the absorber on X-ray mask pattern.Due to the dependency between the absorbed X-ray energy distribution in PMMA and the shape of absorber on the X-ray mask,without the compensation for mask design,the deformed shapes of sloped side-wall on the exposed structures are observed.The factors causing the de- formation are investitated.The effect of dose-d... |
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| Keywords: | polymethyl methacrylate synchrotron radiation X-ray lithography micro needle 3-D structure |
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