| a-C:F薄膜的热稳定性与光学带隙的关联 |
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| 引用本文： | 杨慎东,宁兆元,黄峰,程珊华,叶超.a-C:F薄膜的热稳定性与光学带隙的关联[J].物理学报,2002,51(6):1321-1325. |
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| 作者姓名： | 杨慎东 宁兆元 黄峰 程珊华 叶超 |
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| 作者单位： | 苏州大学物理系,苏州215006; |
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| 摘 要： | 以CF4和C6H6的混合气体作为气源,在微波电子回旋共振化学气相沉积(ECRCVD)装置中制备了氟化非晶碳薄膜(aC:F),并在N2气氛中作了退火处理以考察其热稳定性.通过傅里叶变换红外吸收谱和紫外可见光谱获得了薄膜中CC双键的相对含量和光学带隙,发现膜中CC键含量与光学带隙之间存在着密切的关联,在高微波功率下沉积的氟化非晶碳膜具有低的光学带隙和较好的热稳定性.
关键词：
氟化非晶碳膜
光学带隙
退火温度
热稳定性
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| 关 键 词： | 氟化非晶碳膜 光学带隙 退火温度 热稳定性 |
| 收稿时间： | 6/9/2001 12:00:00 AM |
| 修稿时间： | 2001年6月9日 |
Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films |
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| Yang Shen-Dong,Ning Zhao-Yuan,Huang Feng,Cheng Shan-Hua and Ye Chao.Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films[J].Acta Physica Sinica,2002,51(6):1321-1325. |
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| Authors: | Yang Shen-Dong Ning Zhao-Yuan Huang Feng Cheng Shan-Hua and Ye Chao |
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| Abstract: | Fluorinated amorphous carbon films were deposited using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF 4 and C 6H 6 as source gas and were annealed in nitrogen ambience in order to investigate their thermal stability.The relative concentration of CC bond and optical bandgap were obtained by Fourier transform infrared (FTIR) spectroscopy and Ultraviolet-Visible(UV-VIS)spectrum respectively.It demonstratesd that there is a close relationship between relative concentration of CC bond and optical bandgap, and the films deposited at higher microwave power have a lower optical bandgap and better thermal stability. |
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| Keywords: | fluorinated amorphous carbon film optical bandgap annealing temperature thermal stability |
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