Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force |
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| Institution: | 1. Molecular-Level Interface Research Center, Department of Chemistry, KAIST, Daejeon 305-701, Republic of Korea;2. Department of Chemistry, Myongji University, Yongin 449-728, Republic of Korea;1. Shandong Shengli Bioengineering Co., LTD., Jining 272000, Shandong, China;2. Faculty of Materials Science and Chemical Engineering, State Key Laboratory Base of Novel Functional Materials and Preparation Science, Ningbo University, Ningbo 315211, China |
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| Abstract: | Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry. |
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