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Parametric study on femtosecond laser pulse ablation of Au films
Authors:Xiaochang Ni  Ching-yue Wang  Li Yang  Jianping Li  Lu Chai  Wei Jia  Ruobing Zhang  Zhigang Zhang
Affiliation:a Electronic Engineering Department, Tianjin University of Technology and Education, Tianjin 300222, China
b Key Laboratory of Optoelectronic Information Technical Science, EMC, China
c Ultrafast Laser Laboratory, School of Precision Instruments and Optoelectronics Engineering, Tianjin University, Tianjin 300072, China
Abstract:Ablation process of 1 kHz rate femtosecond lasers (pulse duration 148 fs, wavelength 775 nm) with Au films on silica substrates has been systemically studied. The single-pulse threshold can be obtained directly. For the multiple pulses the ablation threshold varies with the number of pulses applied to the surface due to the incubation effect. From the plot of accumulated laser fluence N × ?th(N) and the number of laser pulses N, incubation coefficient of Au film can be obtained (s = 0.765). As the pulse energy is increased, the single pulse ablation rate is increasing following two ablation logarithmic regimes, which can be explained by previous research.
Keywords:52.38Mf   42.70.Hj   68.55-a   81.05BX
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