Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching |
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| Authors: | Hua Zhang Nabil A Amro Robert Elghanian Joseph Fragala |
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| Institution: | a NanoInk Inc., 4901 Searle Parkway, Skokie, IL 60077, USA
b NanoInk Inc., 215 E. Hacienda Ave., Campbell, CA 95008, USA |
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| Abstract: | A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. |
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| Keywords: | Micro-contact printing Wet chemical etching Reactive ion etching Silicon Silicon oxide |
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