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Characterization of oxide thin films using optical techniques
Authors:JH Hao  J Gao
Institution:a Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, China
b Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
Abstract:Thin films of oxide materials are playing a growing role as critical elements in optoelectronic devices and nanoscale devices. In this work, thin films of some typical oxides such as WO3, Ga2O3 and SrTiO3 were investigated. We present measurements of those films, using various optical techniques like photoconductivity transients over a wide time range and photo-Hall measurements. Analysis of the photo-Hall and photoconductivity data permits the determination of the contribution to the photoconductivity made by the carrier mobility and concentration. A model for dispersive carrier transport was proposed to explain the relaxation of the photoconductivity in oxide thin films. In addition, photoluminescence characterization was used to study microstructures and energy band in oxide thin films. The broad emission from oxide host, consisting of several band peaks, was likely due to a recombination process with several possible paths. The dependence of the luminescent intensity on the annealing atmosphere was associated with the presence of oxygen vacancies. It is suggested that our optical analysis efforts have improved the understanding of oxide thin films, and this should lead to the necessary advancements in a variety of devices.
Keywords:78  66&minus  W  07  60&minus  j
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