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Molecular-Dynamics Method for the Simulation of Grain-Boundary Migration
Authors:B. Schönfelder  D. Wolf  S.R. Phillpot  M. Furtkamp
Affiliation:(1) Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA;(2) Institut für Metallkunde und Metallphysik, RWTH Aachen, Kopernikusstrasse 14, 52056 Aachen, Germany;(3) RWTH Aachen, Institut für Metallkunde und Metallphysik, Kopernikusstrasse 14, 52056 Aachen, Germany
Abstract:
A molecular-dynamics method for the simulation of the intrinsicmigration behavior of individual, flat grain boundaries is introducedand validated. A constant driving force for grain-boundary migrationis generated by imposing an anisotropic elastic strain on a bicrystalsuch that the elastic-energy densities in its two halves aredifferent. For the model case of a large-planar-unit-cell, high-angle(001) twist boundary in Cu we show that an elastic strain ofsim1%–4% is sufficient to drive thecontinuous, viscous movement of the boundary at temperatures wellbelow the melting point. The driving forces thus generated (at thehigh end of the experimentally accessible range) enable aquantitative evaluation of the migration process during the timeframe of 10-9 s typically accessible bymolecular-dynamics simulation. For this model high-angle grainboundary we demonstrate that (a) the drift velocity is, indeed,proportional to the applied driving force thus enabling us todetermine the boundary mobility, (b) the activation energy forgrain-boundary migration is distinctly lower than that forgrain-boundary self-diffusion or even self-diffusion in the melt and(c) in agreement with earlier simulations the migration mechanisminvolves the collective reshuffling during local disordering(ldquomeltingrdquo) of small groups of atoms and subsequentresolidification onto the other crystal.
Keywords:grain-boundary migration  grain-boundary diffusion  molecular-dynamics simulation
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