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Effects of (NH4)2Sx treatment on surface work function and roughness of indium-tin-oxide |
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| Authors: | Yow-Jon Lin Chang-Feng You |
| Affiliation: | a Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan, Republic of China b Department of Physics, National Changhua University of Education, Changhua 500, Taiwan, Republic of China |
| Abstract: | In this study, the effects of an (NH4)2Sx treatment on the surface work function (SWF) and roughness of indium-tin-oxide (ITO) have been investigated. From the observed X-ray photoelectron spectroscopy results, optical transmittance measurements, atomic force microscopy measurements and four-point probe measurements, it is suggested that the surface chemical changes and an increase in the sheet resistance had strong effects on the SWF of ITO. We find that the S occupation of oxygen vacancies near the ITO surface after (NH4)2Sx treatment may result in a marked increase in the SWF and a slight increase in the surface roughness. |
| Keywords: | 81.65.&minus b 81.70.Jb 73.30.+y 82.80.Ej 87.64.Gb 78.40.Fy |
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