Ceria concentration effect on chemical mechanical polishing of optical glass |
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Authors: | Liangyong Wang Kailiang Zhang Zhitang Song Songlin Feng |
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Affiliation: | Laboratory of Nano Technology, Research Center of Functional Semiconductor Film Engineering & Technology, Shanghai Institute of Microsystem and Information Technology, CAS, Graduate School of the Chinese Academy of Sciences, Shanghai 200050, China |
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Abstract: | ![]() It was found material removal rate (MRR) sharply increased from 250 to 675 nm/min as the concentration decreased from 1 to 0.25 wt% in optical glass chemical mechanical polishing (CMP) using ceria slurries. Scanning electron microscopy was employed to characterize the ceria abrasive used in the slurry. Atomic force microscopy results showed good surface had been got after CMP. Schematic diagrams of the CMP process were shown. Furthermore, the absorption spectra indicated a sudden change from Ce4+ to Ce3+ of the ceria surface when the concentration decreased, which revealed a quantum origin of the phenomenon. |
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Keywords: | 81.65.Ps |
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