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Single-mode SiON/SiO2/Si optical waveguides prepared by plasma-enhanced chemical vapor deposition |
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| Authors: | Yuan-Kuang Tu Jung-Chuan Chou Shiang-Ping Cheng |
| Institution: | a Telecommunication Labs Ministry of Transportation and Communications Yang-Mei, Taiwan, Republic of China b Telecommunications Labs., Ministry of Transportation and Communications 12, Taiwan, Republic of China c Dept. of Electronic Engineering National Yunlin, Institute of Technology Yunlin, Taiwan, Republic of China d Institute of Electronic Engineering Chung-Yuan Christian University Chung-Li, Taiwan, Republic of China |
| Abstract: | We present the characteristics of low-propagation-loss single-mode SiON / SiO2 / Si planar optical waveguides using plasma-enhanced chemical vapor deposition (PECVD). Using a thermal annealing process and a thick silicon dioxide buffer layer, we get an improvement on the propagation loss by the amounts of 1.24 dB /cm and 1.1 dB /cm, respectively. Optical waveguides with propagation loss lower than 0.3 dB /cm can be achieved. |
| Keywords: | optical waveguide PECVD propagation loss refractive index SiON/SiO2/Si thermal annealing |
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