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Effect on polarization control in 850 nm vertical cavity surface emitting laser fabricated by H ion inclined implantation using tungsten wire as mask
Authors:Haisong Wang  Guotong Du  Junfeng Song  Yuchun Chang
Institution:State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Qianwei Road 10, Changchun City 130012, PR China
Abstract:Polarization character measurements on VCSEL devices, fabricated by ion inclined implantation with various parameters using tungsten wire as mask, were performed. The effect of polarization mode control was observed in these devices with square injected current aperture formed by distributed ion during implantation. Moreover, the effect depended on the size of the square injected current aperture. The device with highest polarization mode suppression ratio (PMSR) up to 14 dB was obtained, which kept the operation of linear polarization state at 3.4Ith injected current. The further optimization to obtain the better polarization control effect is available. What the most valuable is that the mechanism of polarization control effect is completely self-formed during device processing. Furthermore, this method is the simplest technique to apply in industry, as much as we know.
Keywords:VCSEL  Ion implantation  Polarization control
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