|
|||||
|
|
Study of semiconductor lasers under simultaneous uniaxial stress and hydrostatic pressure |
|
| Authors: | H D Hochheimer F Widulle J Th Held G Strehl R T Kotitschke A R Adams |
| Institution: | 1. Department of Physics , Colorado State University , Fort Collins, CO, 80524, USA;2. Department of Physics , University of Surrey , Guildford, GU2 5XH, United Kingdom |
| Abstract: | Abstract We present the design of a device for the simultaneous application of uniaxial stress and hydrostatic pressure. This new apparatus will for the first time allow measurements at constant strain. Results of the simultaneous application of uniaxial stress and hydrostatic pressure to a semiconductor laser are presented and discussed. |
| Keywords: | Uniaxial stress hydrostatic pressure semiconductor lasers |