Temperature dependence of the current-voltage characteristics of the Al/Rhodamine-101/p-Si(1 0 0) contacts |
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Authors: | ?. Karata?,M. Ç akar |
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Affiliation: | a University of Kahramanmara? Sütçü ?mam, Faculty of Sciences and arts, Department of Physics, Kahramanmara?, Turkey b Yüzüncü Y?l University, Faculty of Sciences and arts, Department of Physics, Van, Turkey c University of Kahramanmara? Sütçü ?mam, Faculty of Sciences and arts, Department of Chemistry, Kahramanmara?, Turkey d Atatürk University, Faculty of Sciences and arts, Department of Physics, 25240 Erzurum, Turkey |
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Abstract: | The current-voltage (I-V) characteristics of Al/Rhodamine-101/p-Si/Al contacts have been measured at temperatures ranging from 280 to 400 K at 20 K intervals. A barrier height (BH) value of 0.817 eV for the Al/Rh101/p-Si/Al contact was obtained at the room temperature that is significantly larger than the value of 0.58 eV of the conventional Al/p-Si Schottky diode. While the barrier height Φb0 decreases the ideality factors (n) become larger with lowering temperature. The high values of n depending on the sample temperature may be ascribed to decrease of the exponentially increase rate in current due to space-charge injection into Rh101 thin film at higher voltage. Therefore, at all temperatures, it has been seen that the I-V characteristics show three different regions, the ohmic behavior at low voltages, and the space charge limited current with an exponential distribution of traps at high voltages. |
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Keywords: | 73.61.Ph 73.40.Lq 73.40.Ns 73.40.Ei 73.30.+y |
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