Defect sites in thin films of germanium dioxide irradiated with silicon ions

Optical transmission spectra of GeO₂ films irradiated with silicon ions and subjected to postimplantation annealing in the regime of silicon nanocrystal formation are analyzed. It is shown that point defects form in the films after irradiation with doses D ～ 10²⁰ m^?2: germanium electron centers, neutral oxygen vacancies, and Ge²⁺ centers, which have been annealed at a temperature of 1000°C for an hour. At D ≥ 1 × 10²¹ m^?2, more complex defects arise in the films, which are only partially annealed under the same conditions.