Electronic and structural properties of hydrogen on semiconductor surfaces

In this paper we will review the scientific literature which addresses the atomic geometry and electronic structure of clean and hydrogenated semiconductor surfaces. In particular, results related to vibrational studies will be presented. First, surfaces of elemental semiconductors (Ge, Si), Ge/Si-alloys, and III–V compound semiconductors chemisorb in a first stage atomic hydrogen by saturating surface atom dangling bonds. In a second step surface bonds are broken and a change of the geometrical structure results. Finally, higher hydrogen exposures are able to etch semiconductor surfaces. Best understood to date are surfaces of Si(1 0 0), Si(1 1 1), Ge_xSi_1−x(1 0 0), and III–V's after cleavage which have been modeled by dimerized and undimerized structures. (1 0 0) surfaces of III–V semiconductors, like GaAs and InP, tend to be dimerized, too.