| 光化学烧孔及其在频域光存储中的应用 |
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| 引用本文： | 王夺元.光化学烧孔及其在频域光存储中的应用[J].化学进展,1994,6(3):214-228. |
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| 作者姓名： | 王夺元 |
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| 作者单位： | （中国科学院感光化学研究所 北京 100101） |
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| 摘 要： | 光化学光谱烧孔是近年来发展起来的一种高新技术，在超高密度光学存储中有着光明的应用前景。本文着重从材料科学的角度介绍了其基本原理、材料特性及其在频域光存储技术中应用的最新进展情况。
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| 关 键 词： | 光化学光谱烧孔 频域光学存储 光子选通 填孔效应 室温烧孔材料 |
Photochemical Hole Burning and Its Applications in the Frequency Domain Optical Storage |
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| Wang Duoyuan.Photochemical Hole Burning and Its Applications in the Frequency Domain Optical Storage[J].Progress in Chemistry,1994,6(3):214-228. |
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| Authors: | Wang Duoyuan |
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| Institution: | (Institute of Photographic Chemistry, Chinese Academy of Sciences, Beijing 100101) |
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| Abstract: | The photochemical hole burning is an advanced technique developed in recent years.It offers the potential for an extremely high density optical storage.In this papor the principle of thephotochemical hole burning and some important properties of materials for frequency domain opticalstorage are presen ted.Some current topics from viewpoint of the practical prospects for ultra highdensity frequency domain optical strogage are reviewed with 37 references. |
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| Keywords: | photochemical hole burning frequency domain optical storage photon-gating pro-cess hole filling induced by gating beam room temperature hole burning materials |
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