| Abstract: | The dependence of ion energy distribution (IED) of planar radiofrequency driven inductively coupled plasma source on pressure and power is analyzed by using plasma monitor. The transition from capacitive coupling (E mode) to inductive coupling (H mode) is observed between 100 and 200 W for C4F8 gas pressure in the range from 0.8 to 8 Pa. In the H mode, the concentration of light ions is higher due to an increase in dissociation and ionization rate of C4F8. In the E mode, the IED consists of large peak (round 20 eV) with an appearing saddle structure (0.8 P), whereas at higher pressure (8 P), the IED exhibits an important contribution near zero energy, indicating collisional sheath. In the H mode, in most cases, the IED consists of one peak which is narrower for higher mass. |
