Complications in the 355 nm Pulsed-Laser Polymerization of N-Vinylcarbazole |
| |
Authors: | Ming Yin Christopher Barner-Kowollik Johan P A Heuts Thomas P Davis |
| |
Institution: | 1. Centre for Advanced Macromolecular Design, School of Chemical Engineering and Industrial Chemistry, University of New South Wales, NSW 2052, Sydney, Australia;2. Fax: +61 (2) 9385 6250 |
| |
Abstract: | The propagation kinetics of N-vinylcarbazole (NVC) were carefully investigated via the IUPAC-recommended pulsed-laser polymerization/size-exclusion chromatography technique (PLP-SEC) in the temperature range between –20 and 20°C using 355 nm pulsed irradiation and the photo initiator 2,2-dimethoxy-2-phenylacetophenone (DMPA) as a source of primary radicals. Using this experimental approach, propagation rate coefficients, kp, were not accessible for temperatures exceeding 20°C. There is strong evidence that the monomer itself is excited by pulsed-laser light of 355 nm, thus contributing to the polymerization process via the formation of free radicals. In addition, UV light-induced cationic polymerization processes can not be ignored as a possible side reaction. NVC polymer also absorbs strongly at 355 nm and we speculate that this may lead to bond scission and branch network formation in the PLP process. Laser-controlled molecular weight distributions are only obtained for reaction temperatures below 20°C. The apparent Arrhenius parameters, EA and A, are 22.8 kJ·mol–1 and 3.6×107 L·mol–1·s–1, respectively. These results are divergent from recent literature data. |
| |
Keywords: | |
|
|