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Bistability in a H-terminated Si(1 0 0)2 × 1 surface obtained by ab initio transport calculations
Authors:Y Gohda  S Watanabe
Institution:a Department of Materials Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
b CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
Abstract:We have analyzed electron tunneling due to the electric field from a hydrogen-terminated Si(1 0 0)2 × 1 ultrathin film on a metal substrate by density functional transport calculations. We have obtained a hysteresis loop in the tunneling current, which comes from the existence of two electronic structures. Furthermore, we have clarified that, as a condition of bistable electron transport, a double-barrier potential structure is not necessarily required for zero field, because it can be induced by the electric field.
Keywords:Density functional calculations  Electron transport  Surface electronic phenomena (work function  surface potential  surface states  etc  )  Silicon  Insulating surfaces
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