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Interfacial electronic states of an anthracene derivative deposited on a SiO2 /Si substrate
Authors:Hiroyuki Sasaki  Yutaka Wakayama  Toyohiro Chikyow  Masaki Imamura  Kenji Kobayashi
Affiliation:a Nanomaterials Laboratory, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
b Nanoscale Quantum Conductor Array Project, JCORP, JST, 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan
c Graduate School of Science and Technology, Kobe University, 1-1 Rokkodai, Nada-ku, Kobe, Hyogo 657-8501, Japan
d Department of Mechanical Engineering, Kobe University, 1-1 Rokkodai, Nada-ku, Kobe 657-8501, Japan
e Department of Chemistry, Shizuoka University, 836 Ohya, Shizuoka, Shizuoka 422-8529, Japan
Abstract:The interfacial electronic states of an anthracene derivative (9,10-bis (methylthio) anthracene) on a SiO2/Si(100) substrate were studied using ultraviolet photoelectron spectroscopy (UPS). From the UPS measurements, the work function of the sample surface was found to decrease with increasing molecular coverage in the sub-monolayer range. It is concluded that an interfacial electronic dipole (about 0.34 eV) forms at the molecule/ SiO2 interface and decreases the effective work function.
Keywords:73.20   73.40   72.80.L   79.60
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