Hydrogen adsorption on the silicon (001) surface and on a step on the (111) surface |
| |
Authors: | G. V. Gadijak A. A. Karpushin I. V. Korolenko Ju. N. Morokov M. Tomášek |
| |
Affiliation: | (1) Institute of Theoretical and Applied Mechanics, Siberian Section, Academy of Sciences and Research Department, Novosibirsk State University, 630090 Novosibirsk 90, USSR;(2) J. Heyrovský Institute of Physical Chemistry and Electrochemistry, Czechosl. Acad. Sci., Máchova 7, 121 38 Praha 2, Czechoslovakia |
| |
Abstract: | Adsorption of atomic hydrogen on an ideal (001) silicon surface is investigated in the present paper. Saturation of one of the two dangling bonds of a silicon atom on this surface by hydrogen removes the interaction (hybridization) between them, resulting in the appearance of a bonding and an antibonding chemisorption state associated with the attacked dangling bond, and in the shift of the peak of the remaining unsaturated dangling bond to the energy typical of a surface state of the (111) surface. Further saturation leads to the disappearance of this peak from the energy spectrum. An analogous situation occurs for the silicon atom with two dangling bonds on a step on the (111) surface, when hydrogen is chemisorbed. Both examples testify to the local chemical nature of Shockley surface states in silicon.The authors thank A. N. Sorokin for useful discussions. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|