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High pressure effect on the electrical properties of NiS2
Authors:N. Mori  T. Mitsui  S. Yomo
Affiliation:Department of Physics, Faculty of Science, Hokkaido University, Sapporo, Japan;Tokai University, Minami-ku, Sapporo, Japan
Abstract:A semiconductor-metal transition in the electrical resistance of NiS2, which has been suggested to be a Mott transition, is observed with decreasing temperature under pressure up to 44 kbar. The transition temperature increases with pressure with a slope of dTdP = 6 ± 1 K/kbar. The activation energy in a semiconducting region is found to decrease with increasing pressure and to vanish at about 46 kbar. The critical pressure and temperature are predicted to be 46 ± 2 kbar and 350 ± 20 K.
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