| 多层膜聚光镜对Schwarzschild显微镜成像均匀性的影响 |
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| 引用本文： | 王新,穆宝忠,黄怡,翟梓融,伊圣振,蒋励,朱京涛,王占山,刘红杰,曹磊峰,谷渝秋.多层膜聚光镜对Schwarzschild显微镜成像均匀性的影响[J].强激光与粒子束,2011,23(5). |
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| 作者姓名： | 王新 穆宝忠 黄怡 翟梓融 伊圣振 蒋励 朱京涛 王占山 刘红杰 曹磊峰 谷渝秋 |
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| 作者单位： | 1. 同济大学 物理系, 精密光学工程技术研究所, 上海 200092;2. 上海市特殊人工微结构材料与技术重点实验室， 上海 200092;3. 中国工程物理研究院 激光聚变研究中心， 四川 绵阳 621900 |
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| 基金项目： | 国家自然科学基金项目(10825521,10773007); 上海市科学技术委员会科研计划项目(0952nm06900) |
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| 摘 要： | 提出了利用多层膜聚光镜提高Schwarzschild显微镜成像均匀性的方法。设计了聚光镜的光学结构，使80%的等离子体辐射能量会聚在约0.8 mm直径的范围内。根据成像系统的工作波长和光线在聚光镜表面的入射角度，设计了Mo/Si周期多层膜，制备了聚光镜光学元件，膜层周期厚度为9.64 nm，周期数为30，对18.2 nm波长的峰值反射率为51.7%。利用所设计的聚光镜作为照明系统，对Schwarzschild物镜进行了网格成像实验。结果表明:在1.2 mm视场内可以实现2.5 μm的空间分辨力，并且完全消除了物镜中心遮拦所造成的像面光强分布不均匀性。
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| 关 键 词： | Schwarzschild显微镜 激光等离子体 聚光镜 Mo/Si多层膜 空间分辨力 |
| 收稿时间： | 1900-01-01; |
Influence of multilayer films condenser on imaging uniformity of Schwarzschild microscope |
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| Wang Xin,Mu Baozhong,Huang Yi,Zhai Zirong,Yi Shengzhen,Jiang Li,Zhu Jingtao,Wang Zhanshan,Liu Hongjie,Cao Leifeng,Gu Yuqiu.Influence of multilayer films condenser on imaging uniformity of Schwarzschild microscope[J].High Power Laser and Particle Beams,2011,23(5). |
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| Authors: | Wang Xin Mu Baozhong Huang Yi Zhai Zirong Yi Shengzhen Jiang Li Zhu Jingtao Wang Zhanshan Liu Hongjie Cao Leifeng Gu Yuqiu |
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| Institution: | (1. Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;2. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Tongji University, Shanghai 200092, China;3. Research Center of Laser Fusion, CAEP, P. O. Box 919-988, Mianyang 621900, China) |
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| Abstract: | The method for improving the uniformity of the image using multilayer films condenser is proposed.The optical structure of the condenser is designed,which concentrates 80% energy radiated by plasma to about 0.8 mm diameter range.Based on the system's wavelength and incidence angle of light,the Mo/Si multilayer films with period of 9.64 nm and layers of 30 is designed and the coatings are deposited with magnetron sputtering.The reflectivity of optical elements at 18.2 nm is 51.7%.The grid backlit by EUV rays... |
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| Keywords: | Schwarzschild microscope laser produced plasma condenser Mo/Si multilayer films spatial resolution |
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