Synthesis of silicon-containing esters of phosphorus acids and study of their thermal stability. 3. Thermal rearrangement of triorganosilylmethyl esters of diphenyl phosphoric acid |
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Authors: | M. I. Kabachnik L. S. Zakharov G. N. Molchanova T. D. Drozdova P. V. Petrovskii |
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Affiliation: | 1. A. N. Nesmeyanov Institute of Organometallic Compounds, Academy of Sciences of the USSR, Moscow
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Abstract: | ![]()
1. | A method has been developed for the preparation of a series of triorganosilylmethyl esters of diphenylphosphoric acid. | 2. | All the triorganosilylmethyl esters of diphenylphosphoric acid which were examined undergo thermal rearrangement involving the migration of a radical from the Si atom to the methylene C atom according to a 1,2-shift. The influence of the type of radical at the Si atom on the rate of the rearrangement has been studied. | Translated from Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, No. 7, pp. 1664–1670, July, 1989. |
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