A study of the deposition of polymeric material onto surfaces from fluorocarbon RF plasmas期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

A study of the deposition of polymeric material onto surfaces from fluorocarbon RF plasmas

Authors:	P. J. Astell-Burt J. A. Cairns A. K. Cheetham R. M. Hazel

Affiliation:	(1) Plasma Technology (UK) Limited, North End, Yatton, BS19 4AP Bristol, England;(2) Engineering Sciences Division, AERE Harwell, OX11 0RA Didcot, Oxfordshire, England;(3) Department of Chemical Crystallography, University of Oxford, Parks Road, Oxford, England

Abstract:	A series of fluorocarbon gases, viz., CF₄, C₂F₆, C₃F₈, and CHF₃, have been compared for their relative tendencies to deposit polymeric material onto various surfaces, including Si and SiO₂, under RF plasma conditions. The plasmas were examined by optical emission spectroscopy. C₃F₈ and CHF₃ were found to produce the highest yields of polymers, although these exhibited significant differences in structure (as shown by XPS and IR) and differences in thermal stability, both of which could be minimized by replacing the C₃F₈ gas with a C₃F₈/H₂ mixture. The polymers produced from CHF₃ under the conditions of the present study were found to accumulate preferentially onto Si rather than SiO₂, as verified by the technique of Rutherford backscattering spectrometry.

Keywords:	Plasma polymerization optical spectroscopy RF discharge fluorocarbons silicon
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