Optical properties of the clean and slowly oxidized surface of silicon |
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| Authors: | P Chiaradia S Nannarone |
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| Affiliation: | Istituto di Fisica, Università degli Studi di Roma, Rome, Italy;Istituto di Fisica, Università degli Studi di Camerino, Camerino, Italy |
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| Abstract: | ![]()
The optical absorption of an UHV cleaved (111) surface of Si has been investigated as a function of the exposure to oxygen. Data concerning the disappearing of surface states with oxidation are reported. The sticking coefficient for oxygen of a clean surface of Si is calculated from optical absorption data. |
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