An observation by photoconductivity of strain splitting of shallow bulk donors located near to the surface in silicon mos devices

Photoconductivity is observed in n-channel inversion Si MOSFETS at 4.2 K at infrared frequencies up to 700 cm^?1. Two groups of sharp lines of opposite sign are observed in the regions of 300 and 650 cm^?1 together with a continuum of transitions starting at ～ 350 cm^?1. The sharp lines are interpreted as bound transitions from shallow neutral phosphorous donors and boron acceptors on either side of the depletion layer. The angular dependence of the Zeeman splitting of the sharp lines demonstrates that the normal 90° symmetry of the 100 surface is lifted for devices with thin metal gates due to the presence of a strong unixial stress component.