Frequency dependence of cyclotron resonance in si inversion layers in the region of activated conductivity |
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Authors: | R.J. Wagner T.A. Kennedy B.D. McCombe D.C. Tsui |
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Affiliation: | Naval Research Laboratory, Washington, DC 20375, USA;Bell Laboratories, Murray Hill, New Jersey 07974, USA |
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Abstract: | Cyclotron resonance of electrons in a Si MOSFET has been studied at a number of far infrared laser frequencies and at surface electron densities down to 3 × 10 cm?2 in the activated conductivity regime. The scattering rate exhibits behavior for ωτ > 2 as in the metallic regime. Effective masses obtained from the fits are found to increase with decreasing density at frequencies . It is possible that this continued evidence of metallic-like behavior is due to the fact that the photon energy is larger than the DC activation energy at these densities. |
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