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Interface structure of silicon nanocrystals embedded in an amorphous silica matrix
Authors:Romain Soulairol  Fabrizio Cleri
Institution:1. Institut d''Electronique, Microélectronique et Nanotechnologie (CNRS UMR 8520), Université de Lille I, Av. Poincaré, B.P. 60060, 59652 Villeneuve d''Ascq, France;2. Service de Recherches de Metallurgie Physique, Commissariat à l''Energie Atomique, Centre d''Etudes de Saclay, 91191 Gif-sur-Yvette, France
Abstract:We performed molecular dynamics simulations of the atomic structure of silicon nanocrystals embedded in a stoichiometric amorphous silica matrix. The atom–atom interactions are described by a combination of well-assessed potentials for bulk silicon and SiO2, plus a mixing term to allow adjusting the charge transfer at the interface between Si and silica. For the free-standing Si nanocrystals, we find that the spherical structure is favoured with respect to the faceted one, up to at least a diameter of 6 nm. Correspondingly, the surface layer shows a higher diffusivity than the bulk. When embedded in the silica matrix, nanocrystals are under severe mechanical stress which is released by the combined formation of porosity at the interface and of bridging Si–O–Si bonds, whose density increases with the nanocrystal size. Vibrational frequencies specific to the interface bonding are identified and discussed.
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