Excimer ArF/XeF lasers providing high-power stimulated radiation in Ar/Xe and F lines |
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Authors: | P L Chapovsky S A Kochubei V N Lisitsyn A M Razhev |
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Institution: | (1) Institute of Semiconductor Physics, Siberian Branch of the USSR Academy of Sciences, 90 Novosibirsk, USSR |
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Abstract: | Lasing in atomic lines of noble gases and fluorine, prior to excimer radiation, was observed in an electric discharge ArF/XeF
excimer laser. Some Ar/Xe lines end at metastable levels, which are very important for the formation of ArF/XeF excimer molecules.
Five new lasing lines of atomic fluorine have been obtained. Consideration is given to the use of lasing in atomic and molecular
lines, that occurs in one burst, in investigations of the excitation kinetics of excimer states under the conditions of a
high-pressure electric discharge. |
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Keywords: | 42 55 |
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