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Theoretical Analysis of Super-Resolution Optical Disk Mastering Using a Photoreactive Dye Mask Layer |
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| Authors: | Tsuyoshi Tsujioka Minoru Kume Masahiro Irie |
| Affiliation: | (1) New Materials Research Center, SANYO Electric Co., Ltd., 1-18-13, Hashiridani, Hirakata-City, Osaka 573, Japan;(2) Department of Chemical Science and Technology, Faculty of Engineering, Kyushu University, 6-10-1, Hakosaki, Higashi-ku, Fukuoka 812, Japan |
| Abstract: | The super-resolution mastering of read-only optical disks using a photoreactive bleachable dye mask layer was theoretically analyzed. Equations have been derived which describe the photoreactions of the resist layer and mask layer. A numerical simulation based on these equations showed that the transmittance of the mask directly affects the quality of the formed pit shape. A high-quality pit shape is obtained by using a low transmittance mask. |
| Keywords: | optical disk photoreactive dye super-resolution disk mastering |
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