Li-doping effects on the electrical properties of ZnO films prepared by the chemical-bath deposition method |
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Authors: | Galal A. Mohamed A.B. Abd El-Moiz M. Rashad |
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Affiliation: | Faculty of Science, Physics Department, Assuit University, Assuit, Egypt |
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Abstract: | Zn1−xLixO thin films, with x varying from 0.0 to 0.5, successfully have been deposited on glass substrates using the chemical bath deposition (CBD) technique. J–E characteristics, DC conductivity and dielectric measurements have been carried out. These measurements were done as a function of temperature, Li concentration and applied electric field intensity. The J–E characteristics are explained in terms of the Pool–Frenkel and Schottky effects. The J–E relation and DC conductivity are strongly dependent on both the Li concentration and applied electric field intensity. Dielectric hysteresis was observed between heating and cooling runs which revealed that the dielectric constant often increases slowly in the low-temperature region, then increases faster above the phase transition. |
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Keywords: | Zink oxide films Chemical bath deposition Electrical properties and measurements Dielectric properties |
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