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Calculation of electric fields induced near metal implants by magnetic resonance imaging switched-gradient magnetic fields
Authors:D.N. Buechler  C.H. Durney  D.A. Christensen
Affiliation:

Department of Electrical Engineering, University of Utah, Salt Lake City, UT 84112, USA

Abstract:Electric (E) fields induced near metal implants by MRI switched-gradient magnetic fields are calculated by a new equivalent-circuit numerical technique. Induced E-field results are found for a metallic spinal-fusion implant consisting of two thin wires connected to the metallic case of a current generator as well as for its subsections: a bare U-shaped wire, an insulated U-shaped wire, a cut insulated wire, and a generator. The presence of the metallic implants perturbs the E field significantly. Near the ends of the bare U-shaped wire, the E field is 89.7 times larger than in the absence of the wire. The greatest E field concentration occurs near the ends of the cut insulated wire, where the E field is 196.7 times greater than in the absence of the wire. In all cases, the perturbation of the induced E field by the implanted wire is highly localized within a few diameters of the wire.
Keywords:Magnetic resonance imaging   Metallic implants   Induced electric fields   Safety
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