Post Discharge Chemistry of Aromatic Molecules in Rare Gas |
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Authors: | Luning He Mark Sulkes |
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Institution: | (1) Chemistry Department, Tulane University, New Orleans, LA 70118, USA; |
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Abstract: | We have employed 800 nm 150 fs laser pulses to carry out photoionization (PI) time-of-flight mass spectrometric detection
of intermediates following corona discharges on aromatic molecules (alkylbenzenes and pyridine) in He, stabilized by subsequent
supersonic gas expansions. Observed product peaks appear to be at least roughly in proportion to actual number densities;
PI induced fragmentation of parent ions appears not to be excessive. Consequently, 800 nm fs PI should be useful for general
product analysis applications in plasma chemistry. For most alkylbenzenes subjected to corona discharges in rare gas, the
overall trends in product chemistry are similar in many respects to observed flame and pyrolysis chemistry in rare gases for
the same species. Following discharge, as in those other cases, H deficient carbon radical fragments initially produced react
in turn to form larger aromatic species. However, compared with flame/pyrolysis, discharge produced a larger number of fragment
species, which can lead to a wider and somewhat different range of higher mass aromatic products. Co-addition of even a small
component of O2 to the discharge mixes has a potent effect in inhibiting formation of higher mass aromatic products in alkylbenzenes. |
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