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Structure Stability of LaAlO3 Thin Films on Si Substrates
引用本文:HE Meng,LIU Guo-Zhen,XIANG Wen-Feng,Lü Hui-Bin,JIN Kui-Juan,ZHOU Yue-Liang,YANG Guo-Zhen. Structure Stability of LaAlO3 Thin Films on Si Substrates[J]. 中国物理快报, 2007, 24(9): 2671-2674
作者姓名:HE Meng  LIU Guo-Zhen  XIANG Wen-Feng  Lü Hui-Bin  JIN Kui-Juan  ZHOU Yue-Liang  YANG Guo-Zhen
作者单位:Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
基金项目:Supported by the National Natural Science Foundation of China under Grant Nos 10334070 and 60576015, and the National Basic Research Programme of China under Grant No 2004CB619004.
摘    要:A series of amorphous and single-crystalline LaAlO3 (LAO) thin films are fabricated by laser molecular-beam epitaxy technique on Si substrates under various conditions of deposition. The structure stability of the LAO films annealed in high temperature and various ambients is studied by x-ray diffraction as well as high-resolution transmission electron microscopy. The results show that the epitaxial LAO films have very good stability, and the structures of amorphous LAO thin films depend strongly on the conditions of deposition and post-annealing. The results reveal that the formation of LAO composition during the deposition is very important for the structure stability of LAO thin films.

关 键 词:LaAlO3 稳定性 硅元素 薄膜
收稿时间:2007-04-17
修稿时间:2007-04-17

Structure Stability of LaAlO3 Thin Films on Si Substrates
HE Meng, LIU Guo-Zhen, XIANG Wen-Feng, LU Hui-Bin, JIN Kui-Juan, ZHOU Yue-Liang, YANG Guo-Zhen. Structure Stability of LaAlO3 Thin Films on Si Substrates[J]. Chinese Physics Letters, 2007, 24(9): 2671-2674
Authors:HE Meng   LIU Guo-Zhen   XIANG Wen-Feng   LU Hui-Bin   JIN Kui-Juan   ZHOU Yue-Liang   YANG Guo-Zhen
Affiliation:Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences Beijing 100080
Abstract:A series of amorphous and single-crystalline LaAlO3 (LAO) thin films are fabricated by laser molecular-beam epitaxy technique on Si substrates under various conditions of deposition. The structure stability of the LAO films annealed in high temperature and various ambients is studied by x-ray diffraction as well as high-resolution transmission electron microscopy. The results show that the epitaxial LAO films have very good stability, and the structures of amorphous LAO thin films depend strongly on the conditions of deposition and post-annealing. The results reveal that the formation of LAOcomposition during the deposition is very important for the structure stability of LAO thin films.
Keywords:77.55.+f  68.60.Dv  61.10.Nz
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