Impact of an ion-flux non-uniformity on the sputtering of a target with a surface relief in a glow discharge plasma

The distribution of the sputtering yield averaged over the ion energy and flux density of sputtered atoms in a glow discharge plasma on a surface with a small-amplitude periodic relief has been calculated. The average sputtering yield of the target has a minimum at tops of the relief due to the energy separation of ions within the near-electrode discharge layer, while the flux density of sputtered atoms in this case is maximized due to the higher density of the ion flux on these areas.