Structures and Properties of Zr-N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N2 Partial Pressures 期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

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Structures and Properties of Zr-N Films Prepared by ECR-Microwave Plasma Source Enhanced Direct-Current Magnetron Sputtering Under Different N2 Partial Pressures

摘要：
关键词：	锆-氮薄膜结构性能 ECR微波等离子体增强直流磁控溅射法氮气条件非晶体相位 X射线衍射分析