高光洁度玻璃基片的表面散射和体散射测量

 提出了一种利用总积分散射（TIS）测量K9玻璃基片表面散射和体散射的实验方法。首先采用磁控溅射技术在基片表面沉积厚度为几十nm的金属Ag薄膜，然后将基片的表面和体区分开考虑，通过TIS测得了基片上下表面的均方根粗糙度， 进而求得基片的总散射和表面散射，最后计算得到了体散射。分别利用TIS和原子力显微镜（AFM）测量了3个样品上表面所镀Ag膜的均方根粗糙度，两种方法所得的均方根粗糙度的数值相差不明显，差值分别为0.08，0.11和0.09 nm, 表明TIS和AFM的测量结果相一致。利用该方法测得3块K9玻璃基片的总散射分别为6.06×10^-4，5.84×10^-4和6.48×10^-4，表面散射介于1.25×10^-4~1.56×10^-4之间，由此计算得到的体散射分别为3.10×10^-4，3.30×10^-4和3.61×10^-4。

Measurement of surface and volume scattering of glass substrates with high finish

A new experimental method to measure the surface scattering and volume scattering of the K9 glass substrate by the total integrated scattering(TIS) was presented. Ag film with a few ten nanometers thickness was deposited by magnetron sputtering, which differentiated the surface and volume of the substrate. Root mean square roughness of the front and back surface of the K9 substrate was measured by TIS, according to which the total scattering and the surface scattering of the substrate were obtained and the volume scattering was calculated. The total scatterings of 3 samples were 6.06×10-4，5.84×10-4 and 6.48×10-4, respectively. Surface scatterings were in the range of 1.25×10-4~1.56×10-4. TIS and atomic force microscopy(AFM) were used to measure root mean square roughness of Ag films,