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| 厚二氧化硅光波导薄膜制备及其特性分析 | |
| 引用本文： | 娄丽芳,盛钟延,姚奎鸿,肖丙刚,何赛灵. 厚二氧化硅光波导薄膜制备及其特性分析[J]. 光学学报, 2004, 24(1): 4-28 |
| 作者姓名： | 娄丽芳 盛钟延 姚奎鸿 肖丙刚 何赛灵 |
| 作者单位： | 1. 浙江大学现代光学仪器国家重点实验室,光及电磁波研究中心,杭州,310027 2. 浙江工程学院材料工程中心,杭州,310027 |
| 基金项目： | 浙江省科技计划重大项目 (0 0 110 10 2 7)，高等学校重点实验室访问学者基金资助课题 |
| 摘 要： | 以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积(PECVD)技术，不使用掺杂，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。研究了薄膜折射率和淀积速率与工艺参量之间的关系，通过棱镜耦合仪、傅里叶变换红外光谱、原子力显微镜等测试手段，分析了薄膜的结构和光学特性。结果表明，实验能快速生长厚二氧化硅薄膜，薄膜表面平整，颗粒度均匀，同时薄膜具有折射率精确可控和红外透射性能好的特点，非常适合制作光波导器件。 |
| 关 键 词： | 波导光学 平面光波导 等离子体增强化学气相沉积 二氧化硅薄膜 PECVD 折射率 棱镜耦合仪 傅里叶变换红外光谱 薄膜结构 |
| 收稿时间： | 2002-09-27 |
PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide |
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| Lou Lifang Sheng Zhongyan Yao Kuihong Xiao Binggang He Sailing State Key Lab of Modern Optical Instrument,Center for Optical and Electromagnetic Research,Zhejiang University,Hangzhou Center of Material Engineering,Zhejiang Institute of Technology,Hangzhou. PECVD Deposition and Characterization of Thick Silica Film for Optical Waveguide[J]. Acta Optica Sinica, 2004, 24(1): 4-28 | |
| Authors: | Lou Lifang Sheng Zhongyan Yao Kuihong Xiao Binggang He Sailing State Key Lab of Modern Optical Instrument Center for Optical Electromagnetic Research Zhejiang University Hangzhou Center of Material Engineering Zhejiang Institute of Technology Hangzhou |
| Affiliation: | Lou Lifang 1 Sheng Zhongyan 1 Yao Kuihong 2 Xiao Binggang 1 He Sailing 1 1 State Key Lab of Modern Optical Instrument,Center for Optical and Electromagnetic Research,Zhejiang University,Hangzhou 310027 2 Center of Material Engineering,Zhejiang Institute of Technology,Hangzhou 310027 |
| Abstract: | Without doping,plasma enhanced chemical vapor deposition (PECVD) of silica films on Si substrates with gas mixtures of SiH_4 and N_2O is considered. Various factors affecting the refractive index and the deposition rate of the deposited film are studied in order to optimize the growth process of the films. The microstructures and optical properties of the films are examined by a prism coupler,a Fourier transform infrared spectroscopy (FTIR) and an atom force microscopy (AFM). The results show that a thick film with a uniform surface and small loss for infrared light can be rapidly deposited by the PECVD technology and refractive index of the film can be controlled accurately. |
| Keywords: | guided wave and fiber optics planar optical waveguide PECVD silica film |
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