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Acceleration complex for extreme ultraviolet nanolithography based on a free-electron laser with kilowatt-scale average radiation power |
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| Authors: | E M Syresin V S Anchutkin Yu A Budagov A B Bel’skii O P Gushchin I F Lenskii A G Ol’shevskii A N Sisakyan G V Trubnikov N A Shelepin G D Shirkov M V Yurkov |
| Institution: | 1. Joint Institute for Nuclear Research, Dubna, Moscow oblast, 141980, Russia 2. OAO S.A. Zvereva Krasnogorskii Zavod, Krasnogorsk, Moscow oblast, 143400, Russia 3. OAO NIIME i Mikron, Zelenograd, Moscow, 124460, Russia 4. OAO Dubna-Sistema, Dubna, Moscow oblast, 141980, Russia 5. DESY, 22607, Hamburg, Germany |
| Abstract: | The project of an acceleration complex is described that is based on a 0.7-GeV superconducting linear accelerator for the free-electron laser used for extreme ultraviolet lithography at a 13.5-nm wavelength with a 0.5-kW average power of laser radiation, as well as for examination of materials using X-ray and vacuum-ultraviolet radiations. |
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