Optogalvanic detection of negative ions in discharges

With the aid of rf, microwave and dc discharges, an optogalvanic (OG) signal, due to the photodetachment of negative oxygen ions, has been observed. The OG signal intensity in an rf discharge was successfully estimated from the discharge parameters. Thus, the OG technique may be potentially useful as a plasma diagnostic method. Furthermore, the OG signal from negative oxygen ions is found to be strong in the diffusion-controlled positive column, while the OG signal due to the excited levels of atomic oxygen is strong in the cathode fall region. Preliminary results for the observation of the OG signal in discharges of H₂, CO, H₂O₂, and (COCH₃)₂ are also described.