Eu:Lu2O3透明闪烁陶瓷的制备与性能

采用湿化学法合成了Eu原子掺量5%的Lu₂O₃陶瓷前驱体,通过SEM、XRD研究了煅烧前后前驱体和1 100 ℃煅烧4 h后粉体的形貌、结构以及物相。结果表明煅烧后的粉体为纳米类球形、高分散且结晶性良好的颗粒。颗粒尺寸为68.5 nm。使用煅烧后的粉体为原料,在1 650 ℃真空烧结30 h制备了高透过率的Eu:Lu₂O₃陶瓷,晶粒尺寸为46 μm,在611 nm处的直线透过率可以达到66.3%。此外对陶瓷的吸收曲线、光致激发和发射光谱特性以及X射线激发发射光谱进行研究。可观察到,Eu:Lu₂O₃陶瓷存在基质和激活离子两类吸收,光致发光光谱和X射线激发发射光谱均可以看出Eu:Lu₂O₃陶瓷存在极强的⁵D₀→⁷F₂跃迁发光,位于611 nm处。对比商业的BGO单晶的X射线发射光谱,可得本实验中制备的陶瓷的光输出为85 000 ph/MeV。Eu:Lu₂O₃陶瓷本身有着高X射线以及高能粒子的阻止能力,结合高光输出特性,表明Eu:Lu₂O₃陶瓷在X射线成像等领域具有巨大的潜在应用价值。     

HIRFL–CSR加速器中束流与真空中剩余气体的碰撞损失

研究了重离子加速器中束流与真空中剩余气体的碰撞损失过程和碰撞截面,在依据大量实验数据的基础上,提出了一组计算离子一原子的电荷交换截面的经验公式.以兰州重离子加速器HDRFL及冷却储存环CSR为例,给出了依据碰撞截面的公式计算束流在加速器真空中的传输效率的方法,并计算了在不同真空度下HIRFL的ECR源轴向注入束运线、注入器SFC、前束运线、主加速器SSC和后束运线等不同加速阶段及CSR的传输效率,并提出合理的真空度要求.HIRFL的真空分布测量和束流的损失测量证明了该计算方法的可靠性.     

V3+:YAG晶体的生长、色心与光谱性能研究

采用石墨电阻加热的温梯法生长了V:YAG晶体,晶体的不同部位呈现两种不同的颜色:浅绿色和黄褐色.通过对比分析不同颜色V:YAG晶体的室温吸收光谱,推断出石墨发热体高温下扩散出来的C可以起到还原作用,提高晶体中V3+tetra离子的浓度,同时诱导了F心的形成.在1300℃下,对不同颜色的V:YAG晶体进行真空退火处理,发现处于八面体格位中的V3+离子在热激发作用下与近邻的四面体格位Al3+离子存在置换反应,由此产生一定浓度的四面体格位V3+离子.同时,F心在退火过程中被完全消除,释放出来的自由电子被高价态的V离子俘获,可以进一步提高晶体中四面体格位V3+离子的浓度.     

BEPCⅡ大功率波导真空阀门的研制

 大功率波导真空阀门是BEPCⅡ直线加速器微波系统的重点改进项目，作为微波大功率传输和真空密封双重功能的超高真空微波器件，机械结构比较复杂，制造工艺难度大。经过各方努力，已经研究完成16台大功率波导真空阀门，并在2004年全部安装在加速器上使用。目前进入到波导真空阀门的脉冲功率为30~50 MW，高功率运行工作状态良好。对阀门从设计原理、机械结构、微波测试及高功率运行等方面作了较详细的阐述。     

Effect of Ag Doping on Optical and Electrical Properties of ZnO Thin Films

ZnO thin films were prepared on p-type Si (100) substrates by the sol-gel process. The influence of Ag doping at a content of 0.002% on the photoluminescence and current-voltage (I - V) characteristics of ZnO thin films has been investigated. It is found that Ag doping leads to a pronounced increase in the intensity of near band edge emission at 3.23eV and a remarkable red shift of the visible broadband at room temperature. The I - V characteristics of ZnO/p-Si heterojunctions are also changed. These results could be explained by Ag substituting for Zn in Ag doped ZnO thin films.     

Diode-Pumped Self-Q-Switched Cr,Nd：YAG Laser with High Average Output Power

A diode end-pumped self-Q-switched Cr,Nd:YAG laser was established with pulse duration in the range of 8-10ns. The maximum average output power was 4.4 W and the slope efficiency was 27% using an output coupler of R=70%. At pumping power of 17.4 W the laser produces high-quality pulses at 1064 nm in a TEMoo-mode.     

Development of Vacuum Monitoring System in the HL-2A tokamak

HL-2A is the first divertor tokamak in China. The vacuum system is one of the important parts of the HL-2A tokamak, which has to be work well during the physics campaign in 2004. As the tokamak machine is separated from the operation staff during discharges, to guarantee the safe and reliable operation of the vacuum system, it is necessary to watch the vacuum system outside the machine hall with an automatic monitoring system. The paper describes the design and manufacture of the monitoring system.     

双脉冲电子束源实验

2MeV直线感应加速器注入器系统由电子束产生器和脉冲功率系统组成。电子束产生器包括由感应腔组成的阴极电压叠加器、阳极电压叠加器和真空二极管及束输运系统。脉冲功率系统则包含初级功率源Marx、次级功率源Blumlein线和触发系统，其作用是为感应腔提供一个具有数十纳秒平顶宽度的高压脉冲，激发感应腔在感应腔间隙上获得一个加速电场。在2MeV注入器功率系统中，4个Blumlein线的充气开关是由发散装置的输出触发信号进行导通控制的。通过控制发散输出触发信号到达Blumlein线开关的时间，即可以实现Blumlein线开关在不同时间内触发导通，使Blumlein线依据所设定的时间顺序输出激励脉冲，从而在真空二极管上获得高压脉冲串。由于功率系统采用的是182C结构，即一根Blumlein线驱动两个感应腔，因此最多可以实现四脉冲串列。     

Vacuum System for HL-2A Tokamak

The vacuum system of today＇s tokamak devices is designed to meet the operational requirements of the experiments. The operation can be divided into five modes, （1） pumping down and leak detecting of the vacuum vessel, （2） baking, （3） plasma-facing component （PFC） conditioning, （4）evacuating and controlling of the particles at plasma edge, （5） plasma discharge experiments.     

A Compact Magnetically Insulated Line Oscillator with New-Type Beam Dump

We present a compact improved model of the magnetically insulated line oscillator with new-type beam dump and other novel features. In the experiments, high-power microwave of the TM01 mode is generated from the device with a frequency range of 1.73-1.78 GHz and a peak power level of above 2 GW, when the diode voltage is taken in the range 520-540kV, and the diode current is in the range 58-62kA. This confirms the simulation results.