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Different techniques for the fabrication of structures containing ensembles of ultrasmall germanium nanoclusters distributed with a high density over the substrate surface are discussed. How to control the morphology and ordering of these ensembles is also discussed.  相似文献   
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The hot bimodal fission of 252Cf is reexamined with new high-statistics data. We constructed a γ-γ-γ coincidence cube for binary fission and LCP-gated γ-γ matrix for ternary fission. By identifying the secondary fission fragments from their γ-ray transitions, we measured the yields for various fission splits. The normal neutron yield distribution is found to be Gaussian for Xe-Ru. However, the binary fission split of Ba-Mo is found to exhibit a bimodal neutron distribution with the “hot mode” corresponding to ≈3.1% of the total yield. In α ternary fission, the first measurements of yields for specific fission splits are presented. The Te-α-Ru and Xe-α-Mo neutron yields fit well with a single mode, but the Ba-α-Zr split shows evidence for an enhanced hot mode with an intensity of ≈13.8% of the normal mode. The text was submitted by the authors in English.  相似文献   
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An empirical relationship describing the radial dependence of the nondipole part of the anisotropic constant for the ligand hyperfine interaction in alkaline-earth fluorides is proposed. This relationship is used for calculating the distances between the magnetic ion and the fluorine ions involved in its nearest environment. The results of the calculations are in good agreement with the values obtained by other methods for both cubic and tetragonal fluorine centers in these crystals. The distances from the magnetic ion to different groups of nonequivalent fluorine ions of the nearest environment in Yb3+ trigonal centers of SrF2 and BaF2 are determined. It is found that the Yb3+ ion is slightly displaced along the trigonal axis away from the compensating fluorine ion.  相似文献   
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The short-lived isotopes of W and their descendants have been isolated from the products of the bombardment of144Sm with24Mg by a fast continuous ion-exchange method, using HF solution media. The feasibility of this method for isolation of element 106 is discussed.  相似文献   
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Ternary fission of 252Cf was studied at Gammasphere using eight ΔE×E particle telescopes. Helium, beryllium, boron, and carbon light charged particles (LCPs) emitted with kinetic energy more than 9, 21, 26, and 32 MeV, respectively, were identified. The 3368-keV γ transition from the first 2+ excited state in 10Be was found and the population probability ratio N(2+)/N(0+) = 0.160 ± 0.025 was estimated. No evidence was found for 3368-keV γ rays emitted from a triple molecular state. For the first time, charge distributions are obtained for ternary fission fragments emitted with helium, beryllium, and carbon LCPs.  相似文献   
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The total thickness and composition of a residual oxide layer after chemical etching of p-GaAs:Zn + In has been studied by X-ray photoelectron spectroscopy (XPS). The variation of the Ga to As oxides ratio along the depth has been determined. A concentration correlation of doping isovalent impurity and the dislocation density with the composition of residual oxides is looked for. The total thickness of the residual oxide layer on p- and semi-insulating GaAs is about 5–6 Å. It is found that the Ga2O3 quantity in the oxide bulk is greater than the same value of As2O3 in highly In-doped samples. In-doping in concentrations over 1.5 × 1019 cm−3 increases the Ga2O3 content and the density of the residual oxide. This influence is determined by reducing the dislocation density and changing the point defect environment. The presence of As-rich precipitates on the dislocations and in the matrix decreases the sputtering time and changes the composition of the residual oxide. The correlation between the type of high temperature dislocations revealed by Abrahams-Buiocchi (AB) etching and the oxide layer composition is shown. The results obtained could be used in the first stages of epitaxial growth, metallization and other technological processes of semiconductor device and ICs fabrication.  相似文献   
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