Al掺杂原子分数及退火温度对ZnO薄膜光学特性的影响

 采用溶胶凝胶法在（0001）Al₂O₃衬底上制备了不同掺杂原子分数的ZnO:Al薄膜，在Ar气氛中进行了600～950 ℃不同温度的退火处理，研究了掺杂原子分数和退火温度对薄膜光致发光、光吸收和透射的影响。结果显示，薄膜的紫外峰强度随掺杂原子分数和退火温度的提高而增强，与缺陷相关的绿光强度却随着掺杂原子分数和退火温度的提高而降低；薄膜光学带隙随掺杂原子分数的提高从3.21 eV增大到3.25 eV；光吸收在可见光区随着退火温度的升高而增大，在紫外区却随着退火温度的升高而减小，透射与吸收的变化规律相反；薄膜吸收边随退火温度的升高出现轻微的红移。     

Optical and structural properties of Ge-ion-implanted fused silica after annealing in different ambient conditions

Ge+ ions are implanted into fused silica glass at room temperature and a fluence of 1×10 17 cm-2 . The as-implanted samples are annealed in O2, N2 and Ar atmospheres separately. Ge0 , GeO and GeO2 coexist in the as-implanted and annealed samples. Annealing in different atmospheres at 600℃ leads each composite to change its content. After annealing at 1000℃, there remains some amount of Ge 0 in the substrates. However, the content of Ge decreases due to out-diffusion. After annealing in N2 , Si–N composite is formed. The absorption peak of GeO appears at 240 nm after annealing in O2 atmosphere, and a new absorption peak occurs at 418 nm after annealing in N2 atmosphere, which is attributed to the Si–N composite. There is no absorption peak appearing after annealing in Ar atmosphere. Transmission electron microscopic images confirm the formation of Ge nanoparticles in the as-implanted sample and GeO 2 nanoparticles in the annealed sample. In the present study, the GeO content and the GeO2 content depend on annealing temperature and atmosphere. Three photoluminescence emission band peaks at 290, 385 and 415 nm appear after ion implantation and they become strong with the increase of annealing temperature below 700℃, and their photoluminescences recover to the values of as-grown samples after annealing at 700℃. Optical absorption and photoluminescence depend on the annealing temperature and atmosphere.