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Engineering Double-Walled Carbon Nanotubes by Ar Plasma   总被引:1,自引:0,他引:1       下载免费PDF全文
Double-walled carbon nanotubes (DWCNTs) have been found to be promising nano-materials for nano-mechanical and nano-electrical devices due to their double-walled structures. Modifying DWCNTs would be one of the key technologies for device construction. We demonstrate engineering the geometry of DWCNTs by etching with Ar plasma. The characterization by atomic force rnicroscopy indicates that single atomic carbon layers could be removed from DWCNTs by Ar plasma. The etching effect is further investigated by electrical measurements on DWCNT field-effect transistors, which allow us to study the interwall screen effect as well.  相似文献   
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用1-丁基苯并咪唑和对苯二甲酸与Zn(NO3)2.6H2O或Cu(NO3)2.3H2O反应合成了两个锌(Ⅱ)和钴(Ⅱ)的一维配位聚合物[Zn(L)2(TP)]n(1)和[Cu(L)2(TP)]n(2)(L=1-丁基苯并咪唑,TP=对苯二甲酸根)。配位聚合物1和2通过C-H…O或O-H…O氢键形成了二维超分子层。测定了L,1和2的荧光发射光谱。  相似文献   
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