Pseudo-Rhombus-Shaped Subwavelength Crossed Gratings of GaAs for Broadband Antireflection

Holographic lithography coupled with the nonlinear response of photoresist to the exposure is adopted to fabricate porous photoresist （PR） mask. Conventional dot PR mask is also generated, and both patterns are transferred into a underlying GaAs substrate by the optimal dry etching process to obtain tapered subwavelength crossed gratings （SWCGs） to mimic the moth-eye structure. In comparison of the experiment and simulation, the closely-packed pseudo-rhombus-shaped GaAs SWCGs resulting from the porous mask outperforms the conical counterpart which comes from the dot mask, and achieves a reported lowest mean spectral reflectance of 1.1%.     

High efficiency and broad bandwidth grating coupler between nanophotonic waveguide and fibre

A high efficiency and broad bandwidth grating coupler between a silicon-on-insulator (SOI) nanophotonic waveguide and fibre is designed and fabricated. Coupling efficiencies of 46% and 25% at a wavelength of 1.55 μm are achieved by simulation and experiment, respectively. An optical 3 dB bandwidth of 45 nm from 1530 nm to 1575 nm is also obtained in experiment. Numerical calculation shows that a tolerance to fabrication error of 10 nm in etch depth is achievable. The measurement results indicate that the alignment error of ±2 μm results in less than 1 dB additional coupling loss.     

High-performance 4H-SiC junction barrier Schottky diodes with double resistive termination extensions

4H-SiC junction barrier Schottky (JBS) diodes with a high-temperature annealed resistive termination extension (HARTE) are designed, fabricated and characterized in this work. The differential specific on-state resistance of the device is as low as 3.64 m ·cm2 with a total active area of 2.46×10-3 cm2 . Ti is the Schottky contact metal with a Schottky barrier height of 1.08 V and a low onset voltage of 0.7V. The ideality factor is calculated to be 1.06. Al implantation annealing is performed at 1250℃ in Ar, while good reverse characteristics are achieved. The maximum breakdown voltage is 1000 V with a leakage current of 9×10-5 A on chip level. These experimental results show good consistence with the simulation results and demonstrate that high-performance 4H-SiC JBS diodes can be obtained based on the double HARTE structure.     

Multimode Interference 3-dB Coupler in Silicon-on-Insulator Based on Silicon Rib Waveguides with Trapezoidal Cross Section

A 3-dB multimode interference optical coupler based on rib waveguides with trapezoidal cross section was designed and fabricated on silicon-on-insulator wafer. Potassium hydroxide (KOH) anisotropic chemical etching of silicon was used to fabricate the waveguides to obtain smooth interface. A modified finite-difference beam propagation method was used to simulate the multimode rib waveguide with slope interfaces. The rms roughness of etching interface is as small as 1.49nm. The propagation loss of the waveguide is 1.3dB/cm at wavelength of 1.55μm. The fabricated 3-dB coupler has a good uniformity of 0.2 dB.     

SOI通道转换型多模干涉耦合器的研究

设计和制作了基于SOI的通道转换型多模干涉耦合器。用二维BPM方法分析了耦合器的性能与多模波导宽度和长度的依赖关系.制作出的耦合器能实现良好的通道转换,器件的功率转换比为73,附加损耗为2.2 dB.提高器件制作的精度将能进一步改善耦合器的性能.     

Design, fabrication and characterization of a high-performance microring resonator in silicon-on-insulator

A high-performance microring resonator in a silicon-on-insulator rib waveguide is realized by using the electron beam lithography followed by inductively coupled plasma etching. The design and the experimental realization of this device are presented in detail. In addition to improving relevant processes to minimize propagation loss, the coupling efficiency between the ring and the bus is carefully chosen to approach a critical coupling for high performance operating. We have measured a quality factor of 21,200 and an extinction ratio of 12.SdB at a resonant wavelength of 1549.32nm. Meanwhile, a low propagation loss of 0.89dB/mm in a curved waveguide with a bending radius of 40μm is demonstrated as well.     

A large bandwidth photonic delay line using passive cascaded silicon-on-insulator microring resonators

This paper investigated the design and the characterization of a photonic delay line based on passive cascaded silicon-on-insulator (SOI) microrings.We considered the compromise of group delay,bandwidth and insertion loss.A 3-stage double channel side-coupled integrated spaced sequence of resonator (SCISSOR) device was optimized by shifting the resonance of each microring and fabricated with electron beam lithography and dry etching.The group delay was measured to be 17 ps for non-return-to-zero signals at different bit rates and the bandwidth of 78 GHz was achieved.The experiment result agreed well with our simulation.     

Improved Light Extraction of GaN-based LEDs with Nano-roughened p-GaN Surfaces

p-GaN surfaces axe nano-roughened by plasma etching to improve the optical performance of GaN-based light emitting diodes （LEDs）. The nano-roughened GaN present a relaxation of stress. The light extraction of the LEDs with nano-roughened surfaces is greatly improved when compared with that of the conventional LEDs without nano-roughening. PL-mapping intensities of the nano-roughened LED epi-wafers for different roughening times present two to ten orders of enhancement. The light output powers are also higher for the nano-roughened LED devices, This improvement is attributed to that nano-roughened surfaces can provide photons multiple chances to escape from the LED surfaces,     

微纳加工技术在光电子领域的应用

纳米光电子器件正在成为下一代光电子器件的核心。文章介绍了电子束光刻和电感耦合等离子体刻蚀为代表的徽纳加工技术在光电子学器件中的应用。主要包括量子点激光器、量子点THz探测器和光子晶体器件。     

感应耦合等离子体刻蚀InP/InGaAsP二维光子晶体结构的研究

为实现基于InP/InGaAsP材料的二维光子晶体结构低损伤、高各向异性的干法刻蚀，研究了对InP材料基于Cl₂/BCl₃气体的感应耦合等离子体刻蚀. 从等离子体轰击使衬底升温的角度分析了刻蚀机理，发现离子轰击加热引起的侧蚀与物理溅射在侧壁再沉积之间处于平衡时可以得到高各向异性刻蚀，平衡点将随ICP功率增高而向偏压减小方向移动，从而在近203 V偏压下得到陡直的侧壁. 在优化气体组分后，成功实现了光子晶体结构高各向异性的低偏压刻蚀. 关键词： 光子晶体 InP/InGaAsP 感应耦合等离子体 2/BCl₃')" href="#">Cl₂/BCl₃ 低偏压刻蚀