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By repeatedly pre-cleaning the sputtering chamber with Ar gas and in-situ isochronal annealing samples, NiSi films are successfully prepared on Si (100) substrates in a radio-frequency magnetron sputtering system. A comparison between the obtained NiSi and excess oxygen-contaminated Ni/Si films has been performed by EDX analysis of oxygen atomic content in both the films. Focused ion beam milling technology is employed to make the cross-sections of the samples for characterizing the NiSi film thickness and NiSi/Si interface roughness. The influences of nickel film thickness on the NiSi-film morphology and on the NiSi/Si interface roughness are studied.  相似文献   
2.
Chiral magnetic states are promising for future spintronic applications. Recent progress of chiral spin textures in two-dimensional magnets, such as chiral domain walls, skyrmions, and bimerons, have been drawing extensive attention. Here, via first-principles calculations, we show that biaxial strain can effectively manipulate the magnetic parameters of the Janus Mn Se Te monolayer. Interestingly, we find that both the magnitude and the sign of the magnetic constants of the Heisenberg exchange ...  相似文献   
3.
We report the interplay between two different topological phases in condensed matter physics, the magnetic chiral domain wall(DW), and the quantum anomalous Hall(QAH) effect. It is shown that the chiral DW driven by Dzyaloshinskii–Moriya interaction can divide the uniform domain into several zones where the neighboring zone possesses opposite quantized Hall conductance. The separated domain with a chiral edge state(CES) can be continuously modified by external magnetic field-induced domain expan...  相似文献   
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