表面凹陷对等离子体浸没离子注入均匀性的影响

利用二维流体模型和数值计算方法模拟了等离子体浸没离子注入（ＰⅢ）Ｋ ,具有圆弧凹槽的平面靶周围的鞘层扩展情况,计算了鞘层扩展过程中的电热分布、离子速度和离子密度变化获得了沿靶表面的离子入射角度和注入剂量的分布情况,为等离子体浸没离子注入处理复杂形状靶提供了理论基础。     

Plasma diffusion and transport in a magnetic duct filter

A cathodic arc plasma source equipped with a curved magnetic duct to filter macro-particles was used to study plasma diffusion and transport in the duct.We determine the optimal duct bias,at which the magnetic duct produces the maximum plasma output,for titanium cathodic arc plasma at 50,100 and 150A arc current,and we investigate the parametric effects of the arc current and guiding magnetic field on the optimal duct bias,The optimal bias decreases as the guiding magnetic field increases from 0.01 to 0.04T and is almost independent of the guding magnetic field when the magnetic field strength ranges from 0.04 to 0.06 T,the upper limit for our equipment,The optimal duct bias at 0.04 T guiding magnetic field decreases with increasing arec current.